2015-2016/2013-2014/2011-2012/2009-2010/2007-2008/2006-2005/2004-2003 /2002-2001
Publications

2016

 

  1. T. Satoh, H. Niimi, N. Kikuchi, M. Fujii, T. Seki, J. Matsuo,
    “Solvent-free silver-nanoparticle surface-assisted laser desorption/ionization imaging
    mass spectrometry of the Irganox 1010 coated on polystyrene”,
    International Journal of Mass Spectrometry, 404, 1-7, (2016.6). new

  2. M. Fujii, R. Shishido, T. Satoh, S. Suzuki, J. Matsuo
    “Effects of Molecular Weight and Cationization Agent on the Sensitivity of Bi Cluster SIMS”,
    Rapid Commun. Mass Spectrom., 30, 1722-1726, (2016.7).new

  3.  and .
    "Reactive etching by ClF3–Ar neutral cluster beam with scanning"
    Japanese Journal of Applied Physics, Volume 55, Number 6S2(2016)

  4. Takaaki Aoki, Toshio Seki, Jiro Matsuo
    "Molecular dynamics simulations study of nano particle migration by cluster impact"
    Surface and Coatings Technology.(doi:10.1016/j.surfcoat.2016.04.053)(2016)

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2015


  1. Y. Yokoyama, S. Aoyagi, M. Fujii, J. Matsuo, J. S. Fletcher, N. P. Lockyer, J. C. Vickerman, I. S. Gilmore, R. Havelund, M. P. Seah;
    "Peptide fragmentation and structural analysis by means of ToF-SIMS using huge cluster ion sources", Anal. Chem., 88, pp. 3592-3597, (2016.2).

  2. Kusakari, M., Fujii, M., Seki, T., Matsuo, J.
    "Observation of Liquid water with Ambient SIMS"
    Transactions of the Materials research Socienty of Japan.(2016) (Accept)

  3. Kusakari, M., Fujii, M., Seki, T., Aoki, T., Matsuo, J.
    "Development of ambient SIMS using mega-electron-volt-energy ion probe"
    Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics 34 (3), 034H111
    (2016)

  4. Seki, T., Kusakari, M., Fujii, M., Aoki, T., Matsuo, J.
    "Ambient analysis of liquid materials with Wet-SIMS"
    Nuclear Instruments and Methods in Physics Research,
    Section B: Beam Interactions with Materials and Atoms 371, pp. 189-193(2016.3)

  5. Yamamoto, H., Seki, T., Matsuo, J., Koike, K., Kozawa, T.
    "High-aspect-ratio patterning by ClF3-Ar neutral cluster etching"
    Microelectronic Engineering 141, pp. 145-149(2015.6)

  6. R. Shishido, M. Fujii, T. Seki, T. Aoki, J. Matsuo and S. Suzuki
    “Yields and Images of Secondary Ions from Organic Materials by Different Primary Bi ions
    in Time-of-Flight Secondary Ion Mass Spectrometry”
    Rapid Commun. Mass Spectrom., Wiley, 30, pp.476-482, (2016.1).

  7. H. Gnaser, M. Kusakari, M. Fujii, T. Seki, T. Aoki and J. Matsuo;
    “Secondary ion emission from leucine and isoleucine under argon gas-cluster ion bombardment”
    Journal of Vacuum Science and Technology B, vol.34, 03H102, (2016.1).

  8. M. Kusakari, H. Gnaser, M. Fujii, T. Seki, T. Aoki and J. Matsuo 
    Molecular cluster emission in sputtering of amino acids by argon gas-cluster ions 
    International Journal of Mass Spectrometry, 383-384, 31-37, 2015.